Call Tel CH: +41 444 6353 82 Tel DE: +49 7424 9699616

» Tantalum Sputtering Targets

Tantalum Tantalium Sputtering Targets Sputering
Sputtering is one of the most common and widely used technologies for thin film manufacturing. Target materials are available in a variety of grades and purities to meet specific customer requirements.

Grade 3N, 3N5, 4N, with Ta 99.99%min
Recrystallization  95%min
Grain size ASTM 4 or finer
Surface finish 16Rms max. or Ra 0.4 ( RMS64 or better)
Flatness  0.1mm or 0.15% max
Tolerance    +/-0.010" on all dimensions

Titanex_vCard QR Code